Browsing by Author Moshkalyov S.A.

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Showing results 21 to 30 of 30 < previous 
PreviewIssue DateTitleAuthor(s)AdvisorType
2004Suspended Membranes Made By Silicon Nitride Deposited By Ecr-cvdBiasotto C.; Monte B.; Neli R.R.; Ramos A.C.S.; Diniz I.A.; Moshkalyov S.A.; Doi I.; Swart J.W.-Artigo de evento
2004Control Of Micron And Submicron Feature Dimensions In 2μm Resolution Photolithographic System For Mos And Mems ApplicationsFioravante Jr. N.P.; Manera L.T.; Moshkalyov S.A.; Diniz J.A.; Tatsch P.J.; Grades H.R.J.; Doi I.; Swart J.W.-Artigo de evento
2004Deep Dry Etching Of Silicon Using Bosch Type ProcessGuidini V.O.; Moshkalyov S.A.; Tatsch P.J.-Artigo de evento
2004Use Of A Langmuir Probe For Ecr Plasma CharacterizationDaltrini A.M.; Moshkalyov S.A.; Ramos A.C.S.; Swart J.W.-Artigo de evento
2004Reactive Ion Etching Of Sige Using Halogen-based PlasmasReyes-Betanzo C.; Moshkalyov S.A.-Artigo de evento
2005Growth Of Carbon Nanostructures By Thermal Chemical Vapor Deposition Via Metal CatalysisVerissimo C.; Moshkalyov S.A.; Ramos A.C.S.; Goncalves J.L.; Swart J.W.-Artigo de evento
2003Silicon Nitride Etching In High- And Low-density Plasmas Using Sf6/o2/n2 MixturesReyes-Betanzo C.; Moshkalyov S.A.; Swart J.W.; Ramos A.C.S.-Artigo de periódico
2005Silicon Oxide Sacrificial Layer For Mems ApplicationsBiasotto C.; Boscoli F.A.; Teixeira R.C.; Ramos A.C.S.; Diniz J.A.; Daltrini A.M.; Moshkalyov S.A.; Doi I.-Artigo de evento
2005Langmuir Probe And Optical Emission Spectroscopy Study Of An Inductively Coupled Plasma SourceDaltrini A.M.; Monteiro M.J.R.; Kostryukov A.; Moshkalyov S.A.; Machida M.; Besseler E.-Artigo de evento
2005Inductively Coupled Plasma Test Reactor Development And Plasma MeasurementsMonteiro M.J.R.; Kostryukov A.; Daltrini A.M.; Moshkalyov S.A.; Machida M.; Besseler E.-Artigo de evento