Browsing by Author Swart J.W.

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PreviewIssue DateTitleAuthor(s)AdvisorType
2013Improvement Of The Electrical Contact Between Carbon Nanotubes And Metallic Electrodes By Laser IrradiationSilveira J.V.; Savu R.; Canesqui M.A.; Filho J.M.; Swart J.W.; Filho A.G.S.; Moshkalev S.A.-Artigo de evento
2012Solar-t : Terahertz Photometers To Observe Solar Flare Emission On Stratospheric Balloon FlightsKaufmann P.; Abrantes A.; Bortolucci E.C.; Correia E.; Diniz J.A.; Fernandez G.; Fernandes L.O.T.; Gimenez De Castro C.G.; Godoy R.; Hurford G.; Kudaka A.S.; Lebedev M.; Lin R.P.; MacHado N.; Makhmutov V.S.; Marcon R.; Marun A.; Nicolaev V.A.; Pereyra P.; Raulin J.-P.; Da Silva C.M.; Shih A.; Stozkhov Y.I.; Swart J.W.; Timofeevsky A.V.; Valio A.; Villelad T.; Zakia M.B.-Artigo de evento
2004Mechanisms Of Silicon Nitride Etching By Electron Cyclotron Resonance Plasmas Using Sf6- And Nf3-based Gas MixturesReyes-Betanzo C.; Moshkalyov S.A.; Ramos A.C.S.; Swart J.W.-Artigo de evento
2004Carbon Nanotubes Growth By Chemical Vapor Deposition Using Thin Film Nickel CatalystMoshkalyov S.A.; Moreau A.L.D.; Guttierrez H.R.; Cotta M.A.; Swart J.W.-Artigo de periódico
2004Micro-raman Stress Characterization Of Polycrystalline Silicon Films Grown At High TemperatureTeixeira R.C.; Doi I.; Zakia M.B.P.; Diniz J.A.; Swart J.W.-Artigo de periódico
2004High Performance Active Pixel Sensors Fabricated In A Standard 2.0 μm Cmos TechnologyMestanza S.N.M.; Jimenez H.G.; IFSilva; Diniz J.A.; Doi I.; Swart J.W.-Artigo de evento
2004Grabado Anisotrópico De Silicio Para Aplicación En Micromaquinado Usando Plasmas De Sf6/ch4/o2/ar Y Sf6/cf4/o2/arReyes-Betanzo C.; Moshkalyov S.A.; Swart J.W.-Artigo de periódico
1997Deposition Of Silicon Nitride By Low-pressure Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition In N2/ar/sih4Moshkalyov S.A.; Diniz J.A.; Swart J.W.; Tatsch P.J.; Machida M.-Artigo de periódico
2005Effects Of The Process Parameters On The Carbon Nanotubes Growth By Thermal CvdVerissimo C.; Moshkalyov S.A.; Ramos A.C.S.; Goncalves J.L.; Alves O.L.; Swart J.W.-Artigo de evento
2004Silicon Oxynitride Gate-dielectric Made By Ecr Plasma OxynitridationManera G.A.; Diniz J.A.; Moshkalyov S.A.; Doi I.; Swart J.W.-Artigo de evento
2004Uncooled Thermal Infrared Detector For Detection Of Far-infrared RadiationNeli R.R.; Doi I.; Melo A.M.; Arbex C.J.N.; Zakia M.B.P.; Kaufmann P.; Diniz J.A.; Swart J.W.-Artigo de evento
2004High Sensitivity Obtained By Three-color Detector Aps-cmos Using Antireflective CoatingMestanza S.N.M.; Biasotto C.; Costa A.C.; Dias G.O.; Doi I.; Diniz J.A.; Swart J.W.-Artigo de evento
2004Study Of Carbon Nanotubes Growth By Atmospheric Pressure Chemical Vapor DepositionVerissimo C.; Moshkalyov S.A.; Ramos A.C.S.; Goncalves J.L.; Leon J.; Swart J.W.-Artigo de evento
2004Selective Etching Of Polycrystalline Silicon In A Hexode Type Plasma EtcherVieira R.; Martarello V.; Moshkalyov S.A.; Diniz J.A.; Swart J.W.-Artigo de evento
2004Ultra-thin Silicon Oxynitride Gate-dielectric Made By Ecr PlasmasManera G.A.; Diniz J.A.; Doi I.; Swart J.W.-Artigo de evento
2004Suspended Membranes Made By Silicon Nitride Deposited By Ecr-cvdBiasotto C.; Monte B.; Neli R.R.; Ramos A.C.S.; Diniz I.A.; Moshkalyov S.A.; Doi I.; Swart J.W.-Artigo de evento
2004Control Of Micron And Submicron Feature Dimensions In 2μm Resolution Photolithographic System For Mos And Mems ApplicationsFioravante Jr. N.P.; Manera L.T.; Moshkalyov S.A.; Diniz J.A.; Tatsch P.J.; Grades H.R.J.; Doi I.; Swart J.W.-Artigo de evento
2004Use Of A Langmuir Probe For Ecr Plasma CharacterizationDaltrini A.M.; Moshkalyov S.A.; Ramos A.C.S.; Swart J.W.-Artigo de evento
2004Formation Of Nickel Silicides Onto As-doped Silicon Using A Thin Pt/pd InterlayerReis R.W.; Dos Santos Filho S.G.; Doi I.; Swart J.W.-Artigo de evento
2005Thermal Stability Of Ni/pt Silicide Films On Bf Doped And Undoped (100)siSantos R.E.; Doi I.; Hayashi M.A.; Diniz J.A.; Swart J.W.; Dos Santos S.G.-Artigo de evento