Browsing by Author Daltrini A.M.

Jump to: 0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z

or enter first few letters:  
Showing results 1 to 17 of 17
PreviewIssue DateTitleAuthor(s)AdvisorType
2008Plasma Diagnostics In An Inductively Coupled Plasma - Gaseous Electronics Conference Reference CellDaltrini A.M.; Moshkalev S.A.; Morgan T.J.; Piejak R.B.; Graham W.G.-Artigo de evento
2009Vuv Spectral Line Emission Measurements In The Tcabr TokamakMachida M.; Daltrini A.M.; Severo J.H.F.; Nascimento I.C.; Sanada E.K.; Elizondo J.I.; Kuznetsov Y.K.-Artigo de periódico
2006Study Of Mode Transitions In Inductively Coupled PlasmasDaltrini A.M.; Moshkalyov S.A.; Monteiro M.J.R.; Machida M.; Besseler E.-Artigo de evento
2006Comparison Of Plasma Parameters Obtained With Planar Probe And Optical SpectrometerSwart L.; Daltrini A.M.; Moshkalyov S.A.; Verdonck P.-Artigo de evento
2006Reactive Ion Etching Of Polycrystalline Silicon Using Thinning Technology In Fluorine Based MixturesNunes A.M.; Moshkalyov S.A.; Tatsch P.J.; Daltrini A.M.-Artigo de evento
2004Use Of A Langmuir Probe For Ecr Plasma CharacterizationDaltrini A.M.; Moshkalyov S.A.; Ramos A.C.S.; Swart J.W.-Artigo de evento
2002Tokamak Nova-unicamp Recent ResultsDaltrini A.M.; Machida M.; Monteiro M.J.R.; Kaminishikawahara C.O.-Artigo de evento
2006Plasma Diagnostics In High Density ReactorsDaltrini A.M.; Moshkalyov S.; Monteiro M.J.R.; MacHida M.; Kostryukov A.; Besseler E.; Biasotto C.; Diniz J.A.-Artigo de periódico
2006Electron Temperature And Density Measurements By The Unicity Of Particle Confinement Time On The Tcabr TokamakMacHida M.; Nascimento I.C.; Daltrini A.M.; Severo J.H.F.; Sanada E.K.; Galvao R.M.O.-Artigo de periódico
2007Plasma Parameters Obtained With Planar Probe And Optical Emission SpectroscopyDaltrini A.M.; Moshkalev S.A.; Swart L.; Verdonck P.B.-Artigo de evento
2007Plasma Etching Of Polycrystalline Silicon Using Thinning Technology For Application In Cmos And Mems TechnologiesNunes A.M.; Moshkalev S.A.; Tatsch P.J.; Daltrini A.M.-Artigo de evento
2008Plasma Power Measurement And Hysteresis In The E-h Transition Of A Rf Inductively Coupled Plasma SystemDaltrini A.M.; Moshkalev S.A.; Morgan T.J.; Piejak R.B.; Graham W.G.-Artigo de periódico
2008Spectral Line Profile Analysis Using Higher Diffraction Order In Vacuum Ultraviolet RegionMachida M.; Daltrini A.M.; Severo J.H.F.; Nascimento I.C.; Sanada E.K.; Elizondo J.I.; Kuznetsov Y.K.; Galvao R.M.O.-Artigo de evento
2008Impurity Line Emissions In Vuv Region Of Tcabr TokamakMachida M.; Daltrini A.M.; Severo J.H.F.; Nascimento I.C.; Sanada E.K.; Elizondo J.I.; Kuznetsov Y.K.; Galvao R.M.O.-Artigo de evento
2005Silicon Oxide Sacrificial Layer For Mems ApplicationsBiasotto C.; Boscoli F.A.; Teixeira R.C.; Ramos A.C.S.; Diniz J.A.; Daltrini A.M.; Moshkalyov S.A.; Doi I.-Artigo de evento
2005Langmuir Probe And Optical Emission Spectroscopy Study Of An Inductively Coupled Plasma SourceDaltrini A.M.; Monteiro M.J.R.; Kostryukov A.; Moshkalyov S.A.; Machida M.; Besseler E.-Artigo de evento
2005Inductively Coupled Plasma Test Reactor Development And Plasma MeasurementsMonteiro M.J.R.; Kostryukov A.; Daltrini A.M.; Moshkalyov S.A.; Machida M.; Besseler E.-Artigo de evento