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Type: Artigo de evento
Title: Tio2/tino Crystalline Nanometric Superlattices Grown By Mocvd
Author: Fabreguette F.
Sacilotti M.
Chiaramonte T.
Gelamo R.
Cardoso L.P.
Guillot J.
Imhoff L.
De Lucas M.C.M.
Dufour Ph.
Bourgeois S.
Casanove M.-J.
Abstract: TiO2 and TiNO are technologically important materials due to their electric properties, hardness or catalytic abilities. These properties make those materials, very attractive materials for optical, mechanical, electrical and chemical applications, whether they are used as single films or stacked into multilayer structures. This talk presents results concerning the growth and characterization of nanometric single crystal TiO2 and TiNO heterostuctures. These TiO2/TiNO heterostructures were grown by the Low Pressure (60 Torr) MOCVD technique at temperatures ranking from 650 to 750°C. (110) oriented TiO2 single crystals were used as substrates for the growth. 5 periods of 4, 8 and 16 nanometers TiO 2/TiNO/TiO2 layers superlattices and 10 periods of TiO2 with nitrogen delta doping structures were grown and characterized by X-rays, HRTEM, EELS and Raman techniques. X-ray diffraction (rocking curve) highlighted the presence of the superlattice structure (satellites RX diagram) and the presence of strain in some of these structures. Besides, X-rays multiple-diffractions technique indicated the presence of well crystallized TiO2/TiNO layers. High resolution TEM (ELS coupled) measurements showed a 1.4 nm thick nitrogen δ-doping layer. Micro-Raman spectroscopy was used to analyze the crystalline phase and stress within these TiO2/TiNO structures.
Citation: Annales De Chimie: Science Des Materiaux. , v. 28, n. SUPPL. 1, p. - , 2003.
Rights: fechado
Date Issue: 2003
Appears in Collections:Unicamp - Artigos e Outros Documentos

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