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dc.contributor.CRUESPUNIVERSIDADE DE ESTADUAL DE CAMPINASpt_BR
dc.typeArtigo de eventopt_BR
dc.titleCorrosion Resistance Of 2024 Aluminum Alloy Coated With Plasma Deposited A-c:h:si:o Filmspt_BR
dc.contributor.authorMascagni D.B.T.pt_BR
dc.contributor.authorDe Souza M.E.P.pt_BR
dc.contributor.authorDe Alvarenga Freire C.M.pt_BR
dc.contributor.authorSilva S.L.pt_BR
dc.contributor.authorDe Cassia Cipriano Rangel R.pt_BR
dc.contributor.authorDa Cruz N.C.pt_BR
dc.contributor.authorRangel E.C.pt_BR
unicamp.authorDe Alvarenga Freire, C.M., Department of Materials Engineering, University of Campinas - UNICAMPCampinas, SP, Brazilpt_BR
unicamp.author.externalMascagni, D.B.T., Laboratory of Technological Plasmas, Paulista State University - UNESP, Experimental Campus of Sorocaba, Brazilpt
unicamp.author.externalDe Souza, M.E.P., Laboratory of Technological Plasmas, Paulista State University - UNESP, Experimental Campus of Sorocaba, Brazilpt
unicamp.author.externalSilva, S.L., Centro Tecnológico da Marinha em São Paulo - ARAMARIperó, SP, Brazilpt
unicamp.author.externalDe Cássia Cipriano Rangel, R., Laboratory of Technological Plasmas, Paulista State University - UNESP, Experimental Campus of Sorocaba, Brazilpt
unicamp.author.externalDa Cruz, N.C., Laboratory of Technological Plasmas, Paulista State University - UNESP, Experimental Campus of Sorocaba, Brazilpt
unicamp.author.externalRangel, E.C., Laboratory of Technological Plasmas, Paulista State University - UNESP, Experimental Campus of Sorocaba, Brazilpt
dc.description.abstractAA 2024 aluminum alloy is widely employed in aeronautic and automobilist industries. Its hardness and low density are attractive properties for such industrial areas. However, since it contains copper, it undergoes severe corrosion in aggressive media as saline or low Earth orbit environments. In this work, it was investigated the properties of films deposited by PECVD on AA 2024 aluminum alloy as well as the corrosion resistance of the film/substrate systems under different corrosive atmospheres. Films were prepared in a plasma atmosphere composed of 50% of oxygen and 50% of hexamethyldisiloxane resulting in a total gas pressure of 4.0 Pa. Plasma ignition was promoted by the application of radiofrequency signal (13.56 MHz) to the sample holder while grounding the topmost electrode. The plasma excitation power, P, was changed from 10 to 80 W in the six different set of experiments. Film thickness, measured by profilometer, increases by 5 times as P was elevated from 10 to 80 W. As demonstrated by the infrared spectra of the samples, films are essentially organosilicons with preservation of functional groups of the precursor molecule and with creation of different ones. The oxide proportion and the structure crosslinking degree are affected by the plasma excitation power. According to the results obtained by sessile drop technique, hydrophilic to moderately hydrophobic films are produced with changing P from 10 to 80 W. The corrosion resistance, evaluated by salt spray and electrochemical impedance spectroscopy, EIS, experiments, in general increases after film deposition. It is demonstrated that film deposition improves, in up to 36 times, the resistance of the alloy to salt spray attack. It is also shown an improvement of about 240 times in the alloy resistance under NaCl solution by the EIS data. Micrographs acquired by Scanning Electron Microscopy after the corrosion tests furnish further information on the importance of the layer physical stability on its barrier properties. Furthermore, films highly protect the alloy against the oxygen attack. Interpretations are proposed based on the modification of the plasma kinetics with P, altering film structure, composition and properties.en
dc.relation.ispartofMaterials Researchpt_BR
dc.publisherUniversidade Federal de Sao Carlospt_BR
dc.date.issued2014pt_BR
dc.identifier.citationMaterials Research. Universidade Federal De Sao Carlos, v. 17, n. 6, p. 1449 - 1465, 2014.pt_BR
dc.language.isoenpt_BR
dc.description.volume17pt_BR
dc.description.issuenumber6pt_BR
dc.description.firstpage1449pt_BR
dc.description.lastpage1465pt_BR
dc.rightsabertopt_BR
dc.sourceScopuspt_BR
dc.identifier.issn15161439pt_BR
dc.identifier.doi10.1590/1516-1439.289014pt_BR
dc.identifier.urlhttp://www.scopus.com/inward/record.url?eid=2-s2.0-84922827905&partnerID=40&md5=9853a8d27b3e39ad648c87136ca7b6dapt_BR
dc.date.available2015-06-25T17:52:42Z
dc.date.available2015-11-26T14:19:05Z-
dc.date.accessioned2015-06-25T17:52:42Z
dc.date.accessioned2015-11-26T14:19:05Z-
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dc.description.provenanceMade available in DSpace on 2015-11-26T14:19:05Z (GMT). No. of bitstreams: 2 2-s2.0-84922827905.pdf: 8952730 bytes, checksum: fff361be6b421035b24d8e7f6d86237c (MD5) 2-s2.0-84922827905.pdf.txt: 41863 bytes, checksum: af192c7124eed094ebea6cedef87aad0 (MD5) Previous issue date: 2014en
dc.identifier.urihttp://www.repositorio.unicamp.br/handle/REPOSIP/86318
dc.identifier.urihttp://repositorio.unicamp.br/jspui/handle/REPOSIP/86318-
dc.identifier.idScopus2-s2.0-84922827905pt_BR
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