Please use this identifier to cite or link to this item:
Full metadata record
DC FieldValueLanguage
dc.typeArtigo de eventopt_BR
dc.titleCorrosion Resistance Of 2024 Aluminum Alloy Coated With Plasma Deposited A-c:h:si:o Filmspt_BR
dc.contributor.authorMascagni D.B.T.pt_BR
dc.contributor.authorDe Souza M.E.P.pt_BR
dc.contributor.authorDe Alvarenga Freire C.M.pt_BR
dc.contributor.authorSilva S.L.pt_BR
dc.contributor.authorDe Cassia Cipriano Rangel R.pt_BR
dc.contributor.authorDa Cruz N.C.pt_BR
dc.contributor.authorRangel E.C.pt_BR
unicamp.authorDe Alvarenga Freire, C.M., Department of Materials Engineering, University of Campinas - UNICAMPCampinas, SP, Brazilpt_BR, D.B.T., Laboratory of Technological Plasmas, Paulista State University - UNESP, Experimental Campus of Sorocaba, Brazilpt Souza, M.E.P., Laboratory of Technological Plasmas, Paulista State University - UNESP, Experimental Campus of Sorocaba, Brazilpt, S.L., Centro Tecnológico da Marinha em São Paulo - ARAMARIperó, SP, Brazilpt Cássia Cipriano Rangel, R., Laboratory of Technological Plasmas, Paulista State University - UNESP, Experimental Campus of Sorocaba, Brazilpt Cruz, N.C., Laboratory of Technological Plasmas, Paulista State University - UNESP, Experimental Campus of Sorocaba, Brazilpt, E.C., Laboratory of Technological Plasmas, Paulista State University - UNESP, Experimental Campus of Sorocaba, Brazilpt
dc.description.abstractAA 2024 aluminum alloy is widely employed in aeronautic and automobilist industries. Its hardness and low density are attractive properties for such industrial areas. However, since it contains copper, it undergoes severe corrosion in aggressive media as saline or low Earth orbit environments. In this work, it was investigated the properties of films deposited by PECVD on AA 2024 aluminum alloy as well as the corrosion resistance of the film/substrate systems under different corrosive atmospheres. Films were prepared in a plasma atmosphere composed of 50% of oxygen and 50% of hexamethyldisiloxane resulting in a total gas pressure of 4.0 Pa. Plasma ignition was promoted by the application of radiofrequency signal (13.56 MHz) to the sample holder while grounding the topmost electrode. The plasma excitation power, P, was changed from 10 to 80 W in the six different set of experiments. Film thickness, measured by profilometer, increases by 5 times as P was elevated from 10 to 80 W. As demonstrated by the infrared spectra of the samples, films are essentially organosilicons with preservation of functional groups of the precursor molecule and with creation of different ones. The oxide proportion and the structure crosslinking degree are affected by the plasma excitation power. According to the results obtained by sessile drop technique, hydrophilic to moderately hydrophobic films are produced with changing P from 10 to 80 W. The corrosion resistance, evaluated by salt spray and electrochemical impedance spectroscopy, EIS, experiments, in general increases after film deposition. It is demonstrated that film deposition improves, in up to 36 times, the resistance of the alloy to salt spray attack. It is also shown an improvement of about 240 times in the alloy resistance under NaCl solution by the EIS data. Micrographs acquired by Scanning Electron Microscopy after the corrosion tests furnish further information on the importance of the layer physical stability on its barrier properties. Furthermore, films highly protect the alloy against the oxygen attack. Interpretations are proposed based on the modification of the plasma kinetics with P, altering film structure, composition and properties.en
dc.relation.ispartofMaterials Researchpt_BR
dc.publisherUniversidade Federal de Sao Carlospt_BR
dc.identifier.citationMaterials Research. Universidade Federal De Sao Carlos, v. 17, n. 6, p. 1449 - 1465, 2014.pt_BR
dc.description.provenanceMade available in DSpace on 2015-06-25T17:52:42Z (GMT). No. of bitstreams: 1 2-s2.0-84922827905.pdf: 8952730 bytes, checksum: fff361be6b421035b24d8e7f6d86237c (MD5) Previous issue date: 2014en
dc.description.provenanceMade available in DSpace on 2015-11-26T14:19:05Z (GMT). No. of bitstreams: 2 2-s2.0-84922827905.pdf: 8952730 bytes, checksum: fff361be6b421035b24d8e7f6d86237c (MD5) 2-s2.0-84922827905.pdf.txt: 41863 bytes, checksum: af192c7124eed094ebea6cedef87aad0 (MD5) Previous issue date: 2014en
dc.description.referenceSchneider, O., Kelly, R.G., Localized coating failure of epoxycoated aluminium alloy 2024-T3 in 0.5M NaCl solutions: Correlation between coating degradation, blister formation and local chemistry within blisters (2007) Corrosion Science., 49 (2), pp. 594-619. ,
dc.description.referenceFonseca, I.T., Lima, N., Rodrigues, J.A., Pereira, M.I.S., Salvador, J.C.S., Ferreira, M.G.S., Passivity breakdown of Al 2024-T3 alloy in chloride solutions: A test of the point defect model (2002) Electrochemistry Communications., 4 (5), pp. 353-357. ,
dc.description.referenceCampestrini, P., Van Westing, E.P.M., Hovestad, A., De Wit, J.H.W., Investigation of the chromate conversion coating on Alclad 2024 aluminium alloy: Effect of the pH of the chromate bath (2002) Electrochimica Acta., 47 (7), pp. 1097-1113. ,
dc.description.referenceChan, Y., Yu, Q., Electrochemical characterization of plasma polymer coatings in corrosion protection of aluminum alloys (2005) Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films., 23 (4), p. 991. ,
dc.description.referenceAzioune, A., Marcozzi, M., Revello, V., Pireaux, J.-J., Deposition of polysiloxane-like nanofilms onto an aluminium alloy by plasma polymerized hexamethyldisiloxane: Characterization by XPS and contact angle measurements (2007) Surface and Interface Analysis., 39 (7), pp. 615-623. ,
dc.description.referenceDomingues, L., Oliveira, C., Fernandes, J.C.S., Ferreira, M.G.S., EIS on plasma-polymerised coatings used as pre-treatment for aluminium alloys (2002) Electrochimica Acta., 47 (13-14), pp. 2253-2258. ,
dc.description.referenceFanelli, F., D'Agostino, R., Fracassi, F., GC-MS investigation of hexamethyldisiloxane-oxygen fed cold plasmas: Low pressure versus atmospheric pressure operation (2011) Plasma Processes and Polymers., 8 (10), pp. 932-941. ,
dc.description.referenceChaiwong, C., Rachtanapun, P., Sarapirom, S., Boonyawan, D., Plasma polymerization of hexamethyldisiloxane: Investigation of the effect of carrier gas related to the film properties (2013) Surface and Coatings Technology., 229, pp. 12-17. ,
dc.description.referencePatel, R.P., Wolden, C.A., Plasma-enhanced chemical vapor deposition synthesis of silica-silicone nanolaminates using a single precursor (2011) Journal of Vacuum Science & Technology A, Vacuum, Surfaces, and Films., 29 (2), p. 021012. ,
dc.description.referenceBentez, F., Martnez, E., Esteve, J., Improvement of hardness in plasma polymerized hexamethyldisiloxane coatings by silicalike surface modification (2000) Thin Solid Films., 377-378, pp. 109-114. ,
dc.description.referenceLee, S.H., Lee, D.C., Preparation and characterization of thin films by plasma polymerization of hexamethyldisiloxane (1998) Thin Solid Films., 325 (1-2), pp. 83-86. ,
dc.description.referenceRangel, R.C.C., Souza, M.E.P., Schreiner, W.H., Freire, C.M.A., Rangel, E.C., Cruz, N.C., Effect of the fluorination of DLC film on the corrosion protection of aluminum alloy (AA 5052 (2010) Surface and Coatings Technology., 204 (18-19), pp. 3022-3028. ,
dc.description.referenceHadinata, S.-S., Lee, M.-T., Pan, S.-J., Tsai, W.-T., Tai, C.-Y., Shih, C.-F., Electrochemical performances of diamond-like carbon coatings on carbon steel, stainless steel, and brass (2013) Thin Solid Films., 529, pp. 412-416. ,
dc.description.referenceFernandes, J.C.S., Ferreira, M.G.S., Haddow, D.B., Goruppa, A., Short, R., Dixon, D.G., Plasma-polymerised coatings used as pre-treatment for aluminium alloys (2002) Surface and Coatings Technology., 154 (1), pp. 8-13. ,
dc.description.referenceRangel, R.C.C., Pompeu, T.C., Barros, J.L.S., Jr., Antonio, C.A., Santos, N.M., Pelici, B.O., Improvement of the corrosion resistance of carbon steel by plasma deposited thin films (2012) Recent Researches in Corrosion Evaluation and Protection, pp. 91-116. ,, In Razavi RS, editor. Rijeka: InTech Europept_BR
dc.description.referenceYasuda, H.K., (1985) Plasma Polymerization, , New York Academic Presspt_BR
dc.description.referenceCatherine, Y., Couderc, P., Electrical characteristics and growth kinetics in discharges used for plasma deposition of amorphous carbon (1986) Thin Solid Films., 144 (2), pp. 265-280. ,
dc.description.referenceEsch, S., Bott, M., Michely, T., Comsa, G., Nucleation of homoepitaxial films grown with ion assistance on Pt (111) (1995) Applied Physics Letters., 67 (21), p. 3209. ,
dc.description.referenceRicci, M., Dorier, J.-L., Hollenstein, C., Fayet, P., Influence of argon and nitrogen admixture in HMDSO/O2 plasmas onto powder formation (2011) Plasma Processes and Polymers., 8 (2), pp. 108-117. ,
dc.description.referenceMontarsolo, A., Mossotti, R., Innocenti, R., Vassallo, E., A study on washing resistance of pp-HMDSO films deposited on wool fabrics for anti-pilling purposes (2013) Surface and Coatings Technology., 224, pp. 109-113. ,
dc.description.referenceKo, Y.-M., Choe, H.-C., Jung, S.-C., Kim, B.-H., Plasma deposition of a silicone-like layer for the corrosion protection of magnesium (2013) Progress in Organic Coatings., 76 (12), pp. 1827-1832. ,
dc.description.referenceGengenbach, T.R., Griesser, H.J., Post-deposition ageing reactions differ markedly between plasma polymers deposited from siloxane and silazane monomers (1999) Polymer., 40 (18), pp. 5079-5094. ,
dc.description.referenceKurosawa, S., Choi, B.-G., Park, J.-W., Aizawa, H., Shim, K.-B., Yamamoto, K., Synthesis and characterization of plasma-polymerized hexamethyldisiloxane films (2006) Thin Solid Films., 506-507, pp. 176-179. ,
dc.description.referencePetasch, W., Baumgärtner, K., Räuchle, E., Walker, M., Influence of plasma surface treatment on the adhesion of thin films on metals (1993) Surface and Coatings Technology., 59 (1-3), pp. 301-305. ,
dc.description.referenceWavhal, D.S., Zhang, J., Steen, M.L., Fisher, E.R., Investigation of gas phase species and deposition of SiO2 films from HMDSO/O2 plasmas (2006) Plasma Processes and Polymers., 3 (3), pp. 276-287. ,
dc.description.referenceCasserly, T.B., Gleason, K.K., Chemical vapor deposition of organosilicon thin films from methylmethoxysilanes (2005) Plasma Processes and Polymers., 2 (9), pp. 679-687. ,
dc.description.referenceCoclite, A.M., Milella, A., Palumbo, F., Fracassi, F., D'Agostino, R., Chemical and morphological characterization of low-k dielectric films deposited from hexamethyldisiloxane and ethylene RF glow discharges (2010) Plasma Processes and Polymers., 7 (12), pp. 1022-1029. ,
dc.description.referenceBouteau, M., Cantin, S., Fichet, O., Perrot, F., Teyssié, D., Contribution toward comprehension of contact angle values on single polydimethylsiloxane and poly(ethylene oxide) polymer networks (2010) Langmuir., 26 (22), pp. 17427-17434. ,, PMid:20919692pt_BR
dc.description.referenceBruce, R.L., Lin, T., Phaneuf, R.J., Oehrlein, G.S., Bell, W., Long, B., Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma (2010) Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures., 28 (4), p. 751. ,
dc.description.referenceMansfeld, F., Recording and analysis of AC impedance data for corrosion studies (1981) Corrosion., 37 (5), pp. 301-307. ,
dc.description.referenceHuda, Z., Taib, N.I., Zaharinie, T., Characterization of 2024-T3: An aerospace aluminum alloy (2009) Materials Chemistry and Physics., 113 (2-3), pp. 515-517. ,
dc.description.referenceTrasferetti, B.C., Davanzo, C.U., De Bica Moraes, M.A., Infrared and raman studies on films of organosiloxane networks produced by PECVD (2004) Macromolecules., 37 (2), pp. 459-466. ,
Appears in Collections:Unicamp - Artigos e Outros Documentos

Files in This Item:
File Description SizeFormat 
2-s2.0-84922827905.pdf8.74 MBAdobe PDFView/Open

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.