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dc.typeArtigo de periódicopt_BR
dc.titleEffects Of Helium Ion Irradiation On Fluorinated Plasma Polymerspt_BR
dc.contributor.authorLopes B.B.pt_BR
dc.contributor.authorSchreiner W.pt_BR
dc.contributor.authorDavanzo C.U.pt_BR
dc.contributor.authorDurrant S.F.pt_BR
unicamp.authorDavanzo, C.U., Instituto de Química, Universidade Estadual de Campinas (UNICAMP), 13083-970 Campinas, SP, Brazilpt_BR, B.B., Laboratório de Plasmas Tecnológicos, Universidade Estadual Paulista (UNESP), Campus Experimental de Sorocaba, Avenida Três de Marco 511, Alto de Boa Vista, 18087-180 Sorocaba, SP, Brazilpt, W., Universidade Federal de Paraná, Curitiba, PR, Brazilpt, S.F., Laboratório de Plasmas Tecnológicos, Universidade Estadual Paulista (UNESP), Campus Experimental de Sorocaba, Avenida Três de Marco 511, Alto de Boa Vista, 18087-180 Sorocaba, SP, Brazilpt
dc.description.abstractThe effects of ion irradiation on fluorinated plasma polymer films are investigated using profilometry, surface contact-angle measurements, infrared reflection absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS). Remarkably, helium plasma immersion ion implantation (PIII) of several amorphous hydrogenated fluorinated plasma polymers deposited from C2H2-SF6, C6H6-SF6 or C6F6 produces film compactions of up to 40%, and modifies the surface energy in the 35 to 65dyn cm-1 range. As revealed by IRRAS and XPS, the films contain C-H, C-C, C=C, C=O, O-H and C-F groups. XPS spectra confirm the presence of N (typically ~5%). The films produced from SF6-containing plasmas also contain S. For irradiation times of 80min, the film carbon content is increased, and the fluorine content is greatly reduced, by factors of about 3 to 15, depending on the initial film composition. © 2010 Elsevier B.V.en
dc.relation.ispartofSurface and Coatings Technologypt_BR
dc.identifier.citationSurface And Coatings Technology. , v. 204, n. 18-19, p. 3059 - 3063, 2010.pt_BR
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