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|Type:||Artigo de periódico|
|Title:||Fabrication Of Smooth Diamond Films On Sio2 By The Addition Of Nitrogen To The Gas Feed In Hot-filament Chemical Vapor Deposition|
|Abstract:||The morphology of small roughness diamond films deposited onto thermally oxidized silicon substrates by a process of anisotropic crystalline growth induced by nitrogen in a hot-filament chemical vapor deposition (CVD) reactor was investigated. Square plates of low roughness were obtained on the top surface of the diamond films. Scanning electron microscopy (SEM), atomic force microscopy (AFM) and micro-Raman spectroscopy indicated films made up of good quality. The films possessed a large number of defects due to substitutional nitrogen. Planar defects were created due to large amount of nitrogen introduced in the CVD process. Substitutional nitrogen provoked lateral vacancies that have a catalytic effect on the lateral rate of diamond growth.|
|Citation:||Journal Of Vacuum Science And Technology, Part A: Vacuum, Surfaces And Films. , v. 19, n. 4, p. 1052 - 1056, 2001.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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