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|Type:||Artigo de periódico|
|Title:||Amorphous Hydrogenated Fluorinated Carbon Films Produced By Pecvd|
Da Cruz N.C.
Bica De Moraes M.A.
|Abstract:||Films were deposited from discharges of acetylene-helium-carbon tetrafluoride mixtures. Actinometric optical emission spectrometry (AOES) revealed trends in the concentrations of the plasma species H, CH, F and CF2 as a function of the proportion of CF4 in the feed, Rc. The influence of plasma/polymer surface interactions on the plasma concentrations of such species was investigated using a dynamic form of AOES. Plasma H, CH and F species were possibly produced by the following mechanisms: the gas phase fragmentation of their parent molecules (C2H2 and CF4 or H- or F-containing species; the release of H, CH and F units from the deposited polymer surface upon interaction with energetic plasma particles (helium metastables or electrons). Film composition and structure were probed using transmission infra-red spectrophotometry (IRS) and X-ray photoelectron spectroscopy (XPS). The groups -CH, -C=O, and -CF were present in each fluorinated film. As revealed by 1IRS and XPS, methyl groups in the films were steadily replaced by CFx groups (x = 1-3) as Rc was increased. Similarly, as revealed by XPS and AOES, the degree of fluorination of the films was positively correlated with the plasma F concentration.|
|Citation:||Surface And Coatings Technology. , v. 86-87, n. PART 1, p. 443 - 448, 1996.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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