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|Type:||Artigo de periódico|
|Title:||A Contribution Of Vibrationally Excited Cl2 Molecules To Gaas Reactive Ion Etching In Cl2/ar|
|Abstract:||The experimental results on GaAs RIE in Cl2/Ar are considered within the framework of the ion-neutral synergy model. It has been shown, that the model gives a good agreement with the etch rate data obtained for low Cl2 partial pressure, but fails at the increased chlorine percentage. A possible contribution of vibrationally excited Cl2 molecules to GaAs etch rate has been considered.|
|Citation:||Japanese Journal Of Applied Physics, Part 2: Letters. , v. 35, n. 7 SUPPL. B, p. L940 - L943, 1996.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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