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|Type:||Artigo de periódico|
|Title:||Fluorine-containing Amorphous Hydrogenated Carbon Films|
Bica de Moraes M.A.
|Abstract:||Films were produced from trifluorotoluene/hydrogen (TFT/H2) and trifluorotoluene/tetrafluoromethane (TFT/CF4) mixtures by plasma-enhanced chemical vapour deposition (PECVD) in a vacuum system fed with RF power. Actinometric optical emission spectroscopy was used to determine the trends in the plasma concentration [H] of the species H as a function of the proportion of the comonomer (H2 or CF4) in the plasma feed. Also, the plasma concentration of the species CF2, [CF2], was measured as a function of the proportion of CF4 in the feed. The observed rise in [H] with increasing H2 flows, and a rise in [CF2] with increasing CF4 flows, are attributed to the increased supply of H and CF2 units, respectively, to the discharge. On the other hand, an observed rise in [H] with increasing CF4 flows implies increased gasphase reactions involving the comonomer or plasma/polymer-surface reactions. X-ray photoelectron spectroscopy (XPS) of the films deposited at various proportions of H2 and CF4 indicates the presence of CHn, CH-CF, C=O, CF and CF2 groups. The degree of fluorination of the films decreases as the proportion of H2 in the feed is increased and rises with increasing proportions of CF4.|
|Citation:||Thin Solid Films. , v. 281-282, n. 1-2, p. 294 - 297, 1996.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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